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Quentin, Jack, Omer Evrard

Post Doc
Automated Nanomaterials Engineering
Address
Research center
Interests
About

Quentin Evrard graduated with a degree in Materials Chemistry and Physics from the Université de Strasbourg in France and obtained his Ph.D. from the Institut de Physique et Chimie des Matériaux de Strasbourg/Université de Strasbourg in France in 2017. In 2018 he joined the INSA-Rennes in France as a Post Doc where he studied the nanometrization of 1D lanthanide-based coordination networks via innovative methods such as ultrasound-assisted crystallization. He then joined the Advanced Research Center for Nanolithography in Amsterdam as Postdoctoral fellow in 2020 where he studied the interactions between organic and inorganic components of tin-based photoresists for Extreme Ultraviolet lithography. This project was then transferred to the University of Amsterdam under the supervision of Prof. Albert M. Brouwer in the Molecular Photonics department of the Van't Hoff Institute for Molecular Sciences (University of Amsterdam).

From September 2024 onwards he is a postdoctoral fellow in the Automated Nanomaterials Engineering research line at IIT led by Dr. Milena Arciniegas.

Education

Title: PhD on Multifunctional Layered Simple Hydroxides : Structural investigation, functionalization and properties.
Institute: Université de Strasbourg
Location: Strasbourg
Country: France
From: 2014 To: 2017

Title: Master in material chemistry : Functionalization, exfoliation and reactivity of lamellar hydroxides and oxides
Institute: Université Louis Pasteur
Location: Strasbourg
Country: France
From: 2011 To: 2013

Experience External

Title: Post Doc
Institute: University of Amsterdam
Location: Amsterdam
Country: The Netherlands
From: 2022 To: 2024

Title: Post Doc
Institute: Advanced Research Center for Nanolithography
Location: Amsterdam
Country: The Netherlands
From: 2020 To: 2022

Title: Post Doc
Institute: Institut National des Sciences Appliquées
Location: Rennes
Country: France
From: 2018 To: 2019

Skills

EUV Nanolithography

Tin-cage EUV photoresists

Layered Simple Hydroxides

Lanthanide-based single chain magnets

Hybrid organic-inorganic material

Sonochemistry

Top Publications
2024
Evrard Q., Sadegh N., Mathew S., Zuidinga E., Watts B., Paradiz Dominguez M., Giglia A., Mahne N., Nannarone S., Nishimura A., Goya T., Sugioka T., Vockenhuber M., Ekinci Y., Brouwer A.M.
Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions
ACS Applied Materials and Interfaces, vol. 16, (no. 32), pp. 42947-42956
Article Journal
2023
Evrard Q., Sadegh N., Hsu C.C., Mahne N., Giglia A., Nannarone S., Ekinci Y., Vockenhuber M., Nishimura A., Goya T., Sugioka T., Brouwer A.M.
Influence of the anion in tin-based EUV photoresists properties
Proceedings of SPIE - The International Society for Optical Engineering, vol. 12498
2020
Houard F., Evrard Q., Calvez G., Suffren Y., Daiguebonne C., Guillou O., Gendron F., Le Guennic B., Guizouarn T., Dorcet V., Mannini M., Bernot K.
Chiral Supramolecular Nanotubes of Single-Chain Magnets
Angewandte Chemie - International Edition, vol. 59, (no. 2), pp. 780-784
2020
Evrard Q., Houard F., Daiguebonne C., Calvez G., Suffren Y., Guillou O., Mannini M., Bernot K.
Sonocrystallization as an Efficient Way to Control the Size, Morphology, and Purity of Coordination Compound Microcrystallites: Application to a Single-Chain Magnet
Inorganic Chemistry, vol. 59, (no. 13), pp. 9215-9226
2017
Evrard Q., Chaker Z., Roger M., Sevrain C.M., Delahaye E., Gallart M., Gilliot P., Leuvrey C., Rueff J.-M., Rabu P., Massobrio C., Boero M., Pautrat A., Jaffres P.-A., Ori G., Rogez G.
Layered Simple Hydroxides Functionalized by Fluorene-Phosphonic Acids: Synthesis, Interface Theoretical Insights, and Magnetoelectric Effect
Advanced Functional Materials, vol. 27, (no. 41)
All Publications
2024
Evrard Q., Sadegh N., Mathew S., Zuidinga E., Watts B., Paradiz Dominguez M., Giglia A., Mahne N., Nannarone S., Nishimura A., Goya T., Sugioka T., Vockenhuber M., Ekinci Y., Brouwer A.M.
Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions
ACS Applied Materials and Interfaces, vol. 16, (no. 32), pp. 42947-42956
Article Journal
2024
Sadegh N., Evrard Q., Kraus P.M., Brouwer A.M.
XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist
Journal of Physical Chemistry C, vol. 128, (no. 9), pp. 3965-3974
2023
Sadegh N., Evrard Q., Mahne N., Giglia A., Nannarone S., Brouwer A.M.
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists
Journal of Photopolymer Science and Technology, vol. 36, (no. 5), pp. 373-378
2023
Kumar V., Evrard Q., Leuvrey C., Lenertz M., Garcia Y., Rabu P., Rogez G.
Incorporation of Photo- and Thermoresponsive N-Salicylidene Aniline Derivatives into Cobalt and Zinc Layered Hydroxides
Inorganic Chemistry, vol. 62, (no. 51), pp. 21101-21114
Article Journal
2023
Evrard Q., Sadegh N., Hsu C.C., Mahne N., Giglia A., Nannarone S., Ekinci Y., Vockenhuber M., Nishimura A., Goya T., Sugioka T., Brouwer A.M.
Influence of the anion in tin-based EUV photoresists properties
Proceedings of SPIE - The International Society for Optical Engineering, vol. 12498